一硅化二镍
| 一硅化二镍 | |
|---|---|
| |
| 识别 | |
| CAS号 | 12059-14-2 
|
| PubChem | 14767304 |
| ChemSpider | 21241520 |
| SMILES |
|
| InChI |
|
| InChIKey | RUFLMLWJRZAWLJ-UHFFFAOYSA-N |
| 性质 | |
| 化学式 | Ni2Si |
| 摩尔质量 | 145.473 g/mol g·mol⁻¹ |
| 密度 | 7.40 g/cm3[1] |
| 熔点 | 1255 °C[1] |
| 结构 | |
| 晶体结构 | 正交晶系，oP12 |
| 空间群 | Pnma, No. 62 |
| 晶格常数 | a = 0.502 nm, b = 0.374 nm, c = 0.708 nm |
| 若非注明，所有数据均出自标准状态（25 ℃，100 kPa）下。 | |
一硅化二镍是一种硅化物，化学式为Ni2Si。它可由镍和硅的粉末在高温反应制得，[2]，或由镍的纳米颗粒与苯基硅烷在三辛胺中反应得到。[3]它和铝加热反应，可以得到Al3Ni和Al3Ni2。[4]
参考文献
[编辑]- ^ 1.0 1.1 Haynes, William M. (编). CRC Handbook of Chemistry and Physics 92nd. CRC Press. 2011: 4.77. ISBN 978-1439855119.
- ^ M.M. Verdian; et al. Processing and electrochemical characterization of Ni2Si intermetallic compound produced by vacuum sintering. Vacuum, 2013. 90: 1-5. doi:10.1016/j.vacuum.2012.09.015.
- ^ Joshua M. McEnaney; et al. Solution Synthesis of Metal Silicide Nanoparticles. Inorg. Chem. 2015, 54, 3, 707–709. doi:10.1021/ic502394u.
- ^ Liu, Joyce C.; Mayer, J. W. (1990). Aluminum and Ni–silicide lateral reactions. Journal of Materials Research, 5(2), 334–340. doi:10.1557/JMR.1990.0334.
延伸阅读
[编辑]- Lavoie, C.; d’Heurle, F.M.; Detavernier, C.; Cabral, C., Towards implementation of a nickel silicide process for CMOS technologies, Microelectronic Engineering, Nov 2003, 70 (2–4): 144–157, doi:10.1016/S0167-9317(03)00380-0